Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film
Author:
Affiliation:
1. Department of Materials Science and Engineering, The University of Texas at Arlington, 501 W. 1st Street, Arlington, Texas 76019
Funder
NSF | ENG | Division of Civil, Mechanical and Manufacturing Innovation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.5004145
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effects of Y and Ho doping on microstructure evolution during oxidation of extraordinary stable Hf-B-Si-Y/Ho-C-N films up to 1500 °C;Materials & Design;2024-01
2. Effects of Y and Ho Doping on Microstructure Evolution During Oxidation of Extraordinary Stable Hf-B-Si-Y/Ho-C-N Films Up to 1500 °C;2023
3. Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho addition;Journal of Non-Crystalline Solids;2021-02
4. Microstructure of High Temperature Oxidation Resistant Hf6B10Si31C2N50 and Hf7B10Si32C2N44 Films;Coatings;2020-11-29
5. Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic film;Surface and Coatings Technology;2020-06
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