Correlation of chemical composition and electrical properties of rf sputtered alumina films-Reference-Cited by-同舟云学术

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Correlation of chemical composition and electrical properties of rf sputtered alumina films

Published:2009-03 Issue:2 Volume:27 Page:234-244
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Voigt M.,Bergmaier A.,Dollinger G.,Sokolowski M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3065978

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1. Aqueous solution-processed, self-flattening AlOx:Y dielectrics for fully-transparent thin-film transistors;Ceramics International;2019-09

2. Electrical insulation performance of aluminum oxide layers on metallic substrates – HiPIMS compared to RF-MS;Surface and Coatings Technology;2019-03

3. High-k Gate Dielectrics for Emerging Flexible and Stretchable Electronics;Chemical Reviews;2018-05-22

4. High temperature sensors fabricated on Al 2 O 3 ceramic and nickel-based superalloy substrates;Sensors and Actuators A: Physical;2016-08

5. Substrate Biasing Effect on the Physical Properties of Reactive RF-Magnetron-Sputtered Aluminum Oxide Dielectric Films on ITO Glasses;ACS Applied Materials & Interfaces;2014-02-12

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