Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation-Reference-Cited by-同舟云学术

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Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation

Published:2005 Issue:1 Volume:23 Page:247
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Hamamoto K.,Tanaka Y.,Watanabe T.,Sakaya N.,Hosoya M.,Shoki T.,Hada H.,Hishinuma N.,Sugahara H.,Kinoshita H.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature;Nanotechnology;2024-02-27

2. Commercialization of microcavity plasma devices and arrays: Systems for VUV photolithography and nanopatterning, disinfection of drinking water and air, and biofilm deactivation for medical therapeutics;Plasma Processes and Polymers;2022-08-17

3. Study on the characteristics of atomic hydrogen cleaning carbon contamination on multilayers;Vacuum;2022-02

4. A novel method for optimizing the condition of UV luminescence of microwave light emitting plasma based on neural network;Optics Communications;2022-02

5. Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors;Nanoscale;2020

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