Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse

Published:2000 Issue:6 Volume:18 Page:3313
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Goldfarb Darı́o L.,de Pablo Juan J.,Nealey Paul F.,Simons John P.,Moreau Wayne M.,Angelopoulos Marie

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 145 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photoinduced Solubility Modulation in the Copolymers of Fluoroalkyl, Spiropyranyl, and Isobornyl Methacrylates;ACS Applied Polymer Materials;2023-04-28

2. Scalable and robust silica aerogel materials from ambient pressure drying;Materials Advances;2022

3. Hydrosilylation of High Porosity Porous Silicon with 1-Hexene in Supercritical CO2 Fluid;ECS Journal of Solid State Science and Technology;2021-11-01

4. Development of fluoro-free surfactant rinse solutions for EUV photoresists;International Conference on Extreme Ultraviolet Lithography 2021;2021-10-12

5. Molybdenum nanopillar arrays: Fabrication and engineering;Physica E: Low-dimensional Systems and Nanostructures;2021-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP