Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors-Reference-Cited by-同舟云学术

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Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Published:2021-03 Issue:2 Volume:39 Page:022402
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Deminskyi Petro¹^ORCID,Haider Ali¹,Eren Hamit²,Khan Talha M.¹,Biyikli Necmi³^ORCID

Affiliation:

1. UNAM—Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey

2. Department of Chemical Engineering, Delft University of Technology, van der Maasweg 9, 2629 HZ Delft, The Netherlands

3. Department of Electrical and Computer Engineering, University of Connecticut, 371 Fairfield Way, Storrs, Connecticut 06269-4157

Funder

University of Connecticut

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000701

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Vapor-Phase Halogenation of Hydrogen-Terminated Silicon(100) Using N-Halogen-succinimides;ACS Applied Materials & Interfaces;2023-11-15

2. Selective regulation of Pt clusters inside KY zeolite using atomic layer deposition for n-octane reforming;Fuel;2022-12

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