Structure and photoluminescence features of nanocrystalline Si/SiO[sub 2] films produced by plasma chemical vapor deposition and post-treatment-Reference-Cited by-同舟云学术

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Structure and photoluminescence features of nanocrystalline Si/SiO[sub 2] films produced by plasma chemical vapor deposition and post-treatment

Published:2002 Issue:4 Volume:20 Page:1368
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Wu Xiaochun,Ossadnik Ch.,Eggs Ch.,Veprek S.,Phillipp F.

Publisher

American Vacuum Society

Subject

General Engineering

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