Preoxidation Si cleaning and its impact on metal oxide semiconductor characteristics-Reference-Cited by-同舟云学术

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Preoxidation Si cleaning and its impact on metal oxide semiconductor characteristics

Published:1992-07 Issue:4 Volume:10 Page:795-801
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kasi S. R.,Liehr M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577674

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. N-Heterocyclic Carbene Monolayers on Metal-Oxide Films: Correlations between Adsorption Mode and Surface Functionality;Langmuir;2024-05-03

2. Gas-Phase Wafer Cleaning Technology;Handbook of Silicon Wafer Cleaning Technology;2018

3. Silicon Device Processing;Materials Science and Technology;2013-02-15

4. Adsorption Features of Phthalates and Organophosphorus Compounds on Silicon Wafers;Industrial & Engineering Chemistry Research;2012-10-31

5. Adsorption behavior of two model airborne organic contaminants on wafer surfaces;Chemical Engineering Journal;2012-04

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