EBES4: A new electron-beam exposure system
-
Published:1987-01
Issue:1
Volume:5
Page:47
-
ISSN:0734-211X
-
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
-
language:
-
Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
27 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Notes and References;Principles of Electron Optics;2018
2. Electron beam lithography;Nanolithography;2014
3. Electron-Beam ULSI Applications;Handbook of VLSI Microlithography;2001
4. Pattern generation for the next millennium;Microelectronic Engineering;1997-02
5. Electron-beam microcolumns for lithography and related applications;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11