Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods-Reference-Cited by-同舟云学术

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Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Published:2018-03 Issue:2 Volume:36 Page:02D403
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Becker Nicholas G.¹,Butterworth Anna L.²,Salome Murielle³,Sutton Stephen R.⁴,De Andrade Vincent⁵,Sokolov Andrey⁶,Westphal Andrew J.²,Proslier Thomas⁷

Affiliation:

1. Physics Department, Illinois Institute of Technology, Chicago, Illinois 60616

2. Lawrence Berkley National Laboratory, Berkley, California 94720

3. European Synchrotron Radiation Facility, Grenoble 38000, France

4. GSECARS, University of Chicago, Argonne, Illinois 60439

5. X-Ray Science Department, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439

6. Material Science Division, Argonne National Laboratory, Argonne, Illinois 60439

7. Commissariat de l'énergie atomique, Centre de Saclay, Gif-sur-Yvette 91191, France

Funder

NSF | Directorate for Geosciences

NSF | GEO | Division of Earth Sciences

U.S. Department of Energy

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5025240

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Topological photonics in 3D micro-printed systems;APL Photonics;2021-08-01

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