Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon-Reference-Cited by-同舟云学术

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Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Published:2015-05 Issue:3 Volume:33 Page:031512
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kalkofen Bodo,Amusan Akinwumi A.,Bukhari Muhammad S. K.,Garke Bernd,Lisker Marco,Gargouri Hassan,Burte Edmund P.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4917552

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Germanium surface cleaning and ALD of a protective boron nitride overlayer;Journal of Vacuum Science & Technology A;2023-11-16

2. 3D to 2D perspectives - Traditional and new doping and metrology challenges at the nanoscale;Materials Science in Semiconductor Processing;2023-08

3. Growth mechanism study of boron nitride atomic layer deposition by experiment and density functional theory;Computational Materials Science;2023-01

4. Aspects of oxygen radical interactions with surfaces: effects of relative flux and kinetic energy;Dynamic Processes in Solids;2023

5. Room‐Temperature Metal‐Catalyzed Ultrafast Gasification of Ultrathin Boron Flakes;Advanced Functional Materials;2022-11-22

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