Determination of chemistry and microstructure in SiOx (0.1<x<0.8) films by x‐ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

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Determination of chemistry and microstructure in SiOx (0.1

Published:1996-05 Issue:3 Volume:14 Page:693-698
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Shallenberger Jeffrey R.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580373

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