Large radius new etching system using electron beam excited plasma
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Published:1992-11
Issue:6
Volume:10
Page:2699
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
2 articles.
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1. Low-energy electron beam source;Radiation Effects and Defects in Solids;2011-06
2. 1 kA low‐energy electron‐beam source;Review of Scientific Instruments;1995-06