Low-energy sputtering yields of tungsten and tantalum-Reference-Cited by-同舟云学术

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Low-energy sputtering yields of tungsten and tantalum

Published:2005-11 Issue:6 Volume:23 Page:1545-1547
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Doerner R. P.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2110385

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A linked-scale coupled model of mass erosion and redistribution in plasma-exposed micro-foam surfaces;Journal of Nuclear Materials;2021-09

2. One-Dimensional Model for Hollow Cathode Orifice Lifetime Prediction;Journal of Propulsion and Power;2021-07

3. Sputtering of Tungsten by Beryllium and Neon Ions;Technical Physics Letters;2020-12

4. Effect of processing factors on the microstructure and gradual diffusion of tungstenized layers;Applied Surface Science;2019-05

5. Low-energy helium plasma effects on textured micro-porous tungsten;Journal of Nuclear Materials;2019-04

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