Comparison of air and heptane solvent annealing of block copolymers for bit-patterned media-Reference-Cited by-同舟云学术

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Comparison of air and heptane solvent annealing of block copolymers for bit-patterned media

Published:2017-11 Issue:6 Volume:35 Page:061801
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Owen Allen G.¹,Su Hao¹,Montgomery Angelique¹,Gupta Subhadra¹

Affiliation:

1. Center for Materials for Information Technology (MINT), University of Alabama, Tuscaloosa, Alabama 35487

Funder

NSF ECCS GOALI Nanopatterned Graded Media

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5004150

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. FORC analysis of nanopatterned vs unpatterned films: Coercivity and switching mechanisms;AIP Advances;2022-03-01

2. Fabrication of Nanodevices Through Block Copolymer Self-Assembly;Frontiers in Nanotechnology;2022-02-10

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