Author:
Buh G. H.,Park T.,Yon G. H.,Hong S. J.,Ryoo C. W.,Yoo J. R.,Lee J. W.,Jee Y. J.,Lee J. S.,Jun C. S.,Shin Y. G.,Chung U-ln,Moon J. T.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by
3 articles.
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1. High Dose Implant Stripping;Handbook of Cleaning in Semiconductor Manufacturing;2011-02-22
2. Shortening of Plasma Strip Process Resulting in Better Removal of Photo Resist after High Dose Implantation;Solid State Phenomena;2009-01
3. Effects of resist strip and clean on USJ performance;Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08);2008-05