Dynamic in-plane thermal distortion analysis of an x-ray mask membrane for synchrotron radiation lithography
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Numerical and experimental thermal analysis of polyimide-based x-ray masks at the Canadian Light Source;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2018-01
2. Dynamic finite element approach for analyzing stress and distortion in multilevel devices;Solid-State Electronics;2002-06
3. Blurring effect analysis of an x-ray mask for synchrotron radiation lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-07
4. Transient thermal stability of the x-ray mask SiC-W under short pulse irradiation;Simulation Practice and Theory;1997-05
5. Heat transport in masks for deep X-ray lithography during the irradiation process;Microelectronics Journal;1997-03
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