Deposition of vanadium carbide thin films using compound target sputtering and their field emission
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.2008273
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2. Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target;Journal of Vacuum Science & Technology A;2023-10-27
3. Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets;Surface and Coatings Technology;2022-09
4. Reduction in Work Functions of Transition-Metal Carbides and Oxycarbides upon Oxidation;ACS Omega;2021-05-27
5. Angular resolved mass-energy analysis of species emitted from a dc magnetron sputtered NiW-target;Journal of Vacuum Science & Technology A;2020-03
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