Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films-Reference-Cited by-同舟云学术

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Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films

Published:1996-05 Issue:3 Volume:14 Page:995-1001
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Watanabe Yukio,Shiratani Masaharu,Fukuzawa Tsuyoshi,Kawasaki Hiroharu,Ueda Yoshio,Singh Sanjay,Ohkura Hiroshi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580069

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