Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

Abstract

Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H2 (5%) atmosphere at mild temperature (300°C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy.