Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide-Reference-Cited by-同舟云学术

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Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide

Published:2010-03 Issue:2 Volume:28 Page:238-243
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Schmidt Benjamin W.,Sweet William J.,Bierschenk Eric J.,Gren Cameron K.,Hanusa Timothy P.,Rogers Bridget R.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3294718

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor;Dalton Transactions;2022

2. Selective kinetic growth and role of local coordination in forming Al2TiO5-based coatings at lower temperatures;Materials Advances;2021

3. Femtosecond laser modification of an array of vertically aligned carbon nanotubes intercalated with Fe phase nanoparticles;Nanoscale Research Letters;2013-09-03

4. Precursor Chemistry – Main Group Metal Oxides;Comprehensive Inorganic Chemistry II;2013

5. 2,4-Pentanediolate as an Alkoxide/Diketonate “Hybrid” Ligand and the Formation of Aluminum and Zirconium Derivatives;Inorganic Chemistry;2011-11-04

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