Nanowriter: A new high-voltage electron beam lithography system for nanometer-scale fabrication-Reference-Cited by-同舟云学术

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Nanowriter: A new high-voltage electron beam lithography system for nanometer-scale fabrication

Published:1988-11 Issue:6 Volume:6 Page:2009
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Chen Z. W.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low energy large scan field electron beam column for wafer inspection;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004

2. Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography;Microelectronic Engineering;2002-07

3. Fabrication of <5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically-assisted development;Applied Physics Letters;2001-04-30

4. Nanolithography using ultrasonically assisted development of calixarene negative electron beam resist;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001

5. Nanolithography using a 100 kV electron beam lithography system with a Schottky emitter;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

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