Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking-Reference-Cited by-同舟云学术

Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking

Published:2018-05 Issue:3 Volume:36 Page:031601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Enomoto Satoshi¹,Kozawa Takahiro²

Affiliation:

1. The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan and Photosensitive Materials Research Center, Toyo Gosei, Inzai, Chiba 270-1609, Japan

2. The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5023061

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