Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction-Reference-Cited by-同舟云学术

Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction

Published:2018-03 Issue:2 Volume:36 Page:020601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Martin Aiden A.¹,Depond Philip J.¹,Bagge-Hansen Michael¹,Lee Jonathan R. I.¹,Yoo Jae-Hyuck¹,Elhadj Selim¹,Matthews Manyalibo J.¹,van Buuren Tony¹

Affiliation:

1. Physical and Life Sciences Directorate, Lawrence Livermore National Laboratory, Livermore, California 94550

Funder

U.S. Department of Energy

DOE | LDRD | Lawrence Livermore National Laboratory

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5019742

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. SYNTHESIS FEATURES AND STRUCTURAL CHARACTERIZATION OF CARBON NANOWALLS PREPARED FROM ORGANOBORON COMPOUNDS;Journal of Structural Chemistry;2022-07

2. Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering;Applied Sciences;2021-10-22

3. Chemical vapor deposition of boron-containing films using B(OAlk)3 as precursors: thermodynamic modeling;Russian Chemical Bulletin;2019-11

4. Thermodynamic modeling of decomposition processes of trimethyl borate in different gas mixtures;Materials Today: Proceedings;2019