Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes-Reference-Cited by-同舟云学术

Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes

Published:2020-03 Issue:2 Volume:38 Page:022610
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Basher Abdulrahman H.¹^ORCID,Krstić Marjan²^ORCID,Takeuchi Takae³^ORCID,Isobe Michiro¹,Ito Tomoko¹^ORCID,Kiuchi Masato¹⁴^ORCID,Karahashi Kazuhiro¹^ORCID,Wenzel Wolfgang²^ORCID,Hamaguchi Satoshi¹^ORCID

Affiliation:

1. Center for Atomic and Molecular Technologies, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

2. 3DMM2O—Cluster of Excellence (EXC-2082/1—390761711), Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

3. Department of Chemistry, Faculty of Science, Nara Women’s University, Kitauoya-Higashimachi, Nara 630-8506, Japan

4. National Institute of Advanced Industrial Science & Technology, 1 Chome-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan

Funder

Japan Society for the Promotion of Science

JSPS Core-to-Core Program

Deutsche Forschungsgemeinschaft

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5127532

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