E‐beam deposition characteristics of reactively evaporated Ta2O5 for optical interference coatings-Reference-Cited by-同舟云学术

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E‐beam deposition characteristics of reactively evaporated Ta2O5 for optical interference coatings

Published:1981-04 Issue:3 Volume:18 Page:1303-1305
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Herrmann W. C.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.570921

Cited by 36 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sol-gel prepared amorphous Ta2O5 thin film for application in high LIDT antireflection coating and UV photodetection;Optical Materials;2023-08

2. Effect of ionic oxygen concentration on properties of SiO2 and Ta2O5 monolayers deposited by ion beam sputtering;Optical Materials;2023-02

3. Effects of different oxygen flow on refractive index and absorption characteristics of Ta2O5 film;Tenth International Conference on Thin Film Physics and Applications (TFPA 2019);2019-07-08

4. Electrical Characterization of Al/Ta2O5/Al Structures Grown by Electron Beam Deposition;Acta Physica Polonica A;2014-05

5. Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films;Surface and Coatings Technology;2013-12

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