Role of contaminants in electron cyclotron resonance plasmas-Reference-Cited by-同舟云学术

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Role of contaminants in electron cyclotron resonance plasmas

Published:1993-09 Issue:5 Volume:11 Page:2543-2552
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Goeckner M. J.,Meyer J. A.,Kim G.‐H.,Jenq J.‐S.,Matthews A.,Taylor J. W.,Breun R. A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578605

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-11

2. Chlorine plasma and polysilicon etch characterization in an inductively coupled plasma etch reactor;Plasma Sources Science and Technology;2004-07-13

3. Fourier-transform infrared measurements of CHF3/O2 discharges in an electron cyclotron resonance reactor;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-09

4. Semiconductor and thin film applications of a quadrupole mass spectrometer;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-07

5. Plasma Etching;Handbook of Vacuum Science and Technology;1998

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