Characterization of photoresist films exposed to high-dose implantation conditions-Reference-Cited by-同舟云学术

Characterization of photoresist films exposed to high-dose implantation conditions

Published:2018-01 Issue:1 Volume:36 Page:011201
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Croisy Marion¹,Pargon Erwine²,Jenny Cécile,Richard Claire,Guiheux Denis,Mariolle Denis,Poulain Christophe,Campo Alain,Possémé Nicolas

Affiliation:

1. STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles Cedex, France; CEA-Leti, 17 avenue des Martyrs, F-38054 Grenoble Cedex 9, France; and CNRS-LTM, Université Grenoble Alpes, CEA-Leti Minatec 17 rue des Martyrs, F-38054 Grenoble Cedex, France

2. CNRS-LTM, Université Grenoble Alpes, CEA-Leti Minatec 17 rue des Martyrs, F-38054 Grenoble Cedex, France

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5004127

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