Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography-Reference-Cited by-同舟云学术

Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography

Published:2017-11 Issue:6 Volume:35 Page:06GE01
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Caillau Mathieu¹,Crémillieu Pierre¹,Laurenceau Emmanuelle¹,Chevolot Yann¹,Leclercq Jean-Louis¹,Alekseev Sergeï²,Chevalier Céline³,Delair Thierry⁴

Affiliation:

1. Université de Lyon, Institut des Nanotechnologies de Lyon INL - UMR 5270 CNRS, Ecole Centrale de Lyon, Ecully, F-69134, France

2. Department of Chemistry, Kiev National Taras Schevchenko University, Volodymyrska St, 60, UA-01601 Kiev, Ukraine

3. Université de Lyon, Institut des Nanotechnologies de Lyon INL - UMR 5270 CNRS, INSA Lyon, Villeurbanne 69621, France

4. Université de Lyon, IMP/Polytech, UMR 5223 CNRS, Villeurbanne, F-69622, France

Funder

Doctoral scholarship from Electronic, Electrotechnic and Automatic doctoral school

Pulsalys

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4996870

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chitosan as an Alternative to Oil-Based Materials for the Fabrication of Lab-on-a-Chip;Micromachines;2024-03-12

2. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process;Journal of Vacuum Science & Technology B;2023-10-31

3. Chitosan as material for the elaboration of lab-on-a-chip;2023 IEEE BioSensors Conference (BioSensors);2023-07-30

4. Green deep‐UV photoresist based on chitosan for microelectronics;Journal of Applied Polymer Science;2023-06-02

5. Chitosan as a water-based photoresist for DUV lithography;Advances in Patterning Materials and Processes XL;2023-05-01