Designing MoS2 channel properties for analog memory in neuromorphic applications

Author:

Kurtash Vladislav1ORCID,Thiele Sebastian1,Mathew Sobin1,Jacobs Heiko O.1,Pezoldt Joerg1ORCID

Affiliation:

1. FG Nanotechnologie, Institut für Mikro- und Nanelektronik and Institut für Mikro- und Nanotechnologien MacroNano® and Institut für Werkstofftechnik, TU Ilmenau, Postfach 100565, 98684 Ilmenau, Germany

Abstract

In this paper, we introduce analog nonvolatile random access memory cells for neuromorphic computing. The analog memory cell [Formula: see text] channel is designed based on the simulation model including Fowler–Nordheim tunneling through a charge-trapping stack, trapping process, and transfer characteristics to describe a full write/read circle. 2D channel materials provide scaling to higher densities as well as preeminent modulation of the conductance by the accumulated space charge from the oxide trapping layer. In this paper, the main parameters affecting the distribution of memory states and their total number are considered. The dependence of memory state distribution on channel doping concentration and the number of layers is given. In addition, how the nonlinearity of memory state distribution can be overcome by variation of operating conditions and by applying pulse width modulation to the bottom gate voltage is also shown.

Funder

Carl Zeiss Foundation

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

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