Reduction of water aerosol contamination during pumping of a vacuum chamber from atmospheric pressure

Author:

O’Hanlon John F.,Shieh Jhy‐Jer

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Rough Vacuum Pumping;A Users Guide to Vacuum Technology;2023-11-20

2. Modeling a Wet Wafer Surface Processing Chain;2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM);2023-05

3. Vacuum Techniques And Instrumentation;digital Encyclopedia of Applied Physics;2003-04-15

4. Photon-stimulated desorption from an aluminum surface after water vapor exposure;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-05

5. Water vapor in vacuum systems;Vacuum;1996-04

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