Magnetron sputtering with additional ionization effect by electron beam-Reference-Cited by-同舟云学术

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Magnetron sputtering with additional ionization effect by electron beam

Published:1982-01 Issue:1 Volume:20 Page:98-99
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Adachi R.,Takeshita K.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.571320

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion mass-to-charge ratio in planar magnetron plasma with electron injections;Journal of Physics D: Applied Physics;2018-09-05

2. Vacuum Deposition;Roll-to-Roll Vacuum Deposition of Barrier Coatings;2015-08-29

3. Magnetron Sputtering Source Design and Operation;Vacuum Deposition Onto Webs, Films and Foils;2015

4. The DC Glow Discharge or Plasma;Vacuum Deposition Onto Webs, Films and Foils;2015

5. Magnetron Sputtering Source Design and Operation;Vacuum Deposition onto Webs, Films and Foils;2011

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