Film interface control in integrated processing systems-Reference-Cited by-同舟云学术

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Film interface control in integrated processing systems

Published:1994-07 Issue:4 Volume:12 Page:2741
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Granneman E. H. A.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Vacuum and Plasmas;Introduction to Microfabrication;2010-11-09

2. Process Equipment;Introduction to Microfabrication;2010-11-09

3. Wafer Cleaning and Surface Preparation;Introduction to Microfabrication;2010-11-09

4. Dissolution Kinetics for Atomic, Molecular, and Ionic Contamination from Silicon Wafers during Aqueous Processing;Journal of The Electrochemical Society;1999-09-01

5. Chapter 5 Sputtering tools;PVD for Microelectronics - Sputter Deposition Applied to Semiconductor Manufacturing;1999

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