Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques-Reference-Cited by-同舟云学术

Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

Published:2017-11 Issue:6 Volume:35 Page:061505
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kohout Jiří¹,Qian Jincheng¹,Schmitt Thomas¹,Vernhes Richard¹,Zabeida Oleg¹,Klemberg-Sapieha Jolanta¹,Martinu Ludvik¹

Affiliation:

1. Department of Engineering Physics, Thin Film Research Center–GCM, Polytechnique Montreal, P.O. Box 6079, Station Centre-Ville, Montreal, Quebec H3C 3A7, Canada

Funder

Corning Incorporated

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4999460

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