157 nm resist materials: Progress report-Reference-Cited by-同舟云学术

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157 nm resist materials: Progress report

Published:2000 Issue:6 Volume:18 Page:3396
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Brodsky Colin,Byers Jeff,Conley Will,Hung Raymond,Yamada Shintaro,Patterson Kyle,Somervell Mark,Trinque Brian,Tran H. V.,Cho Sungseo,Chiba Takashi,Lin Shang-Ho,Jamieson Andrew,Johnson Heather,Vander Heyden Tony,Willson C. Grant

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11

3. Chemistry of photolithographic imaging materials based on the chemical amplification concept;Journal of Photochemistry and Photobiology C: Photochemistry Reviews;2008-01-12

4. Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm;Macromolecules;2006-01-26

5. Novel negative tone photodefinable low dielectric constant hybrid films;SPIE Proceedings;2005-05-04

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