Fast simulation of stochastic exposure distribution in electron-beam lithography-Reference-Cited by-同舟云学术

Fast simulation of stochastic exposure distribution in electron-beam lithography

Published:2012-11 Issue:6 Volume:30 Page:06F308
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Zhao Xinyu,Lee Soo-Young,Lee Sang-Hee,Kim Byung-Gook,Cho Han-Ku

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4767447

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