Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance-Reference-Cited by-同舟云学术

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Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance

Published:2005-11 Issue:6 Volume:23 Page:1513-1522
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Vlček Jaroslav,Potocký Štěpán,Čížek Jiří,Houška Jiří,Kormunda Martin,Zeman Petr,Peřina Vratislav,Zemek Josef,Setsuhara Yuichi,Konuma Seiji

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2049298

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3. The Influence of Nitrogen Flow Rate on the Structure and Properties of Mo-Hf-Y-Si-B-N Coatings;Journal of Composites Science;2023-06-17

4. The effect of the Ar/N2 gas ratio on the structure and properties of Ta-Si-N coatings produced by magnetron sputtering of TaSi2 target;Surfaces and Interfaces;2023-04

5. Effect of nitrogen content on high-temperature stability of hard and optically transparent amorphous Hf-Y-Si-B-C-N coatings;Ceramics International;2023-02

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