Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition-Reference-Cited by-同舟云学术

Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition

Published:2017-01 Issue:1 Volume:35 Page:01B129
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Karwal S.,Williams B. L.,Niemelä J.-P.,Verheijen M. A.¹,Kessels W. M. M.,Creatore M.

Affiliation:

1. Department of Applied Physics, University of Technology Eindhoven, P.O. Box 503, 5600 MB Eindhoven, The Netherlands and Philips Innovation Services, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands

Funder

Stichting voor de Technische Wetenschappen (STW)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4972208

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