Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.3670876
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Atomic layer deposition of conductive and semiconductive oxides;Applied Physics Reviews;2022-12
2. Fabrication of Silicon Nanowire Metal-Oxide-Semiconductor Capacitors with Al2O3/TiO2/Al2O3 Stacked Dielectric Films for the Application to Energy Storage Devices;Energies;2021-07-27
3. Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review;Polymers;2021-04-20
4. Titanium dioxide thin films by atomic layer deposition: a review;Semiconductor Science and Technology;2017-08-23
5. Reliability improvements of TiN/Al2O3/TiN for linear high voltage metal–insulator–metal capacitors using an optimized thermal treatment;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-01
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