Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4906819
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3. Ramsauer–Townsend minimum in electron scattering from CF$$_4$$: modified effective range analysis;The European Physical Journal D;2021-03
4. How to address the issue of uniformity in large area capacitively coupled plasmas? A modeling investigation;Plasma Sources Science and Technology;2020-08-05
5. Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals;Journal of Vacuum Science & Technology A;2020-05
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