An apparatus for ion‐beam sputtering and its application to high‐resolution radiotracer depth profiling of diffusion samples-Reference-Cited by-同舟云学术

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An apparatus for ion‐beam sputtering and its application to high‐resolution radiotracer depth profiling of diffusion samples

Published:1992-01 Issue:1 Volume:10 Page:92-97
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Faupel F.,Hüppe P. W.,Rätzke K.,Willecke R.,Hehenkamp Th.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578072

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