Author:
Wolf E. D.,Coane P. J.,Ozdemir F. S.
Cited by
26 articles.
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1. Improved alignment algorithm for electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-11
2. Modeling of electron backscattering from topographic marks;Journal of Applied Physics;1996-12-15
3. High contrast marks for e-beam direct write made by reactive ion etching;Microelectronic Engineering;1992-03
4. Pattern Generation;The Physics of Micro/Nano-Fabrication;1992
5. Overlay precision between electron beam and optical lithography systems for a mix and match GaAs technology;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1989-11