Fabrication of quasi-three-dimensional micro/nanomechanical components using electron beam cross-linked poly (methyl methacrylate) resist
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dielectric strength of cross-linked thin-film poly(methyl methacrylate);2021 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO);2021-08-02
2. Live nanoscopic to mesoscopic topography reconstruction with an optical microscope for chemical and biological samples;PLOS ONE;2018-12-12
3. Fabrication of 3D SiOxstructures using patterned PMMA sacrificial layer;Journal of Micromechanics and Microengineering;2018-01-09
4. Mesoscopic Field-Effect-Induced Devices in Depleted Two-Dimensional Electron Systems;Physical Review Applied;2017-12-14
5. CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
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