Focussed helium ion channeling through Si nanomembranes-Reference-Cited by-同舟云学术

Focussed helium ion channeling through Si nanomembranes

Published:2018-03 Issue:2 Volume:36 Page:021203
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Wang Jiaming¹,Huang Symphony H. Y.¹,Herrmann Christoph¹,Scott Shelley A.²,Schiettekatte François³,Kavanagh Karen L.¹

Affiliation:

1. Department of Physics, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada

2. Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706

3. Department of Physics, University of Montreal, Montreal, Quebec, Canada H3T 1J4

Funder

U.S. Department of Energy

Gouvernement du Canada | Natural Sciences and Engineering Research Council of Canada

Canada Foundation for Innovation

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5020667

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