Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition

Published:2002-09 Issue:5 Volume:20 Page:1779-1783
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Li B. S.,Liu Y. C.,Zhi Z. Z.,Shen D. Z.,Zhang J. Y.,Lu Y. M.,Fan X. W.,Kong X. G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1503783

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus;Applied Surface Science;2011-01

2. BLUESHIFT AND INTENSITY ENHANCEMENT IN VISIBLE EMISSION SPECTRUM OF C-AXIS ORIENTED SPRAY PYROLYTICALLY GROWN NANOCRYSTALLINE ZnO THIN FILMS;Surface Review and Letters;2008-10

3. An investigation on the variations in properties of Ni+irradiated ZnO thin films;Radiation Effects and Defects in Solids;2008-07

4. Plasma-enhanced chemical vapor deposition of zinc oxide at atmospheric pressure and low temperature;Solar Energy Materials and Solar Cells;2007-06

5. Texture development of non-epitaxial polycrystalline ZnO films;Journal of Crystal Growth;2006-03

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