A low temperature process for vapor etching of indium phosphide
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Published:1985-11
Issue:6
Volume:3
Page:1625
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
2 articles.
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1. References;Thin Films by Chemical Vapour Deposition;1990
2. Basic Mechanisms in Plasma Etching;Contributions to Plasma Physics;1989