Method of optimizing registration signals for electron‐beam microfabrication-Reference-Cited by-同舟云学术

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Method of optimizing registration signals for electron‐beam microfabrication

Published:1978-05 Issue:3 Volume:15 Page:901-905
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Stickel W.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.569624

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Subpixel alignment for scanning-beam lithography using one-dimensional, phase-based mark detection;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005

2. Modeling of electron backscattering from topographic marks;Journal of Applied Physics;1996-12-15

3. Marks for alignment and registration in projection electron lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

4. Alignment and registration schemes for projection electron lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11

5. Radiation Exposure;Semiconductor Lithography;1988

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