Author:
Neukermans A.,Saperstein W.
Cited by
19 articles.
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1. Temperature evolution during scanning electron beam processing of silicon;Applied Physics A Materials Science and Processing;1996-05
2. Layering Technologies;The Physics of Micro/Nano-Fabrication;1992
3. The effects of RTA on CMOS devices;Semiconductor Science and Technology;1990-07-01
4. Noise and electrical characterisation of e-beam rapid isothermally annealed n-channel MOSFETS;Semiconductor Science and Technology;1989-05-01
5. Electron Beam Processing;VLSI Electronics Microstructure Science;1989