An aerosol model of particle generation during pressure reduction-Reference-Cited by-同舟云学术

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An aerosol model of particle generation during pressure reduction

Published:1990-05 Issue:3 Volume:8 Page:1961-1968
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Wu J. J.,Cooper D. W.,Miller R. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576789

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4. References;The Foundations of Vacuum Coating Technology;2003

5. A Theoretical Analysis of Wafer Cleaning Using a Cryogenic Aerosol;Journal of The Electrochemical Society;1999-02-01

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