Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition-Reference-Cited by-同舟云学术

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Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition

Published:2016-05 Issue:3 Volume:34 Page:031605
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Shkondin Evgeniy,Takayama Osamu,Lindhard Jonas Michael,Larsen Pernille Voss,Mar Mikkel Dysseholm,Jensen Flemming,Lavrinenko Andrei V.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4947586

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