Optimization of a lithographic and ion beam etching process for nanostructuring magnetoresistive thin film stacks
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 32 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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